High-Temperature Oven Chamber: HTK 1200N
The HTK 1200N is an advanced high-temperature chamber with a robust design for in-situ X-ray diffraction studies in different atmospheres up to 1200 °C.
Its environmental heater guarantees excellent uniformity of the sample temperature. Use the HTK 1200N for different types of in-situ X-ray investigations, including studies of phase transformations, structure determination, and studies of chemical reactions.
Precise temperature measurement and control
Highly reliable temperature measurement right at the sample
Excellent temperature uniformity in the sample
Almost no restrictions on sample thickness
Sample spinning is crucial
Sample spinning option for optimum data quality
Sample carriers of various chemically resistant materials available
Quick exchange of sample carriers for easy sample preparation
The ideal tool for a wide range of applications
Robust and compact design using high quality materials
Fits most available goniometers
Available with automated motorized z-aligment stage for temperature-dependent sample realignment
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| Model | HTK 1200N high-temperature chamber |
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| Operating temperature | 25 °C to 1200 °C |
| Temperature measurement | Pt 10% RhPt thermocouple |
| Atmospheres | Vacuum (10-4 mbar), air, inert gases |
| Max. operating pressure | 1 bar above atmospheric pressure |
| Angle of incidence | 0 to 164° 2Θ |
| Sample holder material | Aluminum oxide |
| Sample diameter | max. 16 mm |
| Measurement geometry | Reflection + transmission |
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HTK 1200N high-temperature chamber
HTK 1200N high-temperature chamber
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